Transform Your Skin with ENO Laboratoire Codexial Enoliss AHA Peeling Masks

Discover the secret to radiant, youthful-looking skin with the ENO Laboratoire Codexial Enoliss AHA Peeling Masks 75ml (2.54 fl oz). Thoughtfully formulated by the renowned French skincare brand, ENO Laboratoire, this high-performing product is designed to give you a salon-style, deep peeling treatment in the comfort of your own home.

Our Enoliss AHA Peeling Masks are enriched with a potent blend of Alpha Hydroxy Acids (AHAs), including glycolic, lactic, and citric acids, which work together to exfoliate the skin gently, removing dead skin cells and revealing a smoother, brighter complexion underneath. These AHAs are known for their ability to boost collagen production, reduce the appearance of fine lines and wrinkles, and improve skin texture and tone.

But the benefits don't stop there. This peeling mask also contains a unique mix of nourishing ingredients like aloe vera and chamomile, which hydrate the skin, soothe irritation, and reduce redness. This powerful combination of exfoliating and soothing ingredients makes this product an exceptional solution for all skin types, including sensitive skin.

The ENO Laboratoire Codexial Enoliss AHA Peeling Mask has a light, gel-like texture that glides effortlessly onto the skin, providing a refreshing, cooling sensation upon application. When the mask is removed, you'll notice an immediate difference in your skin's appearance – it will look brighter, feel smoother, and have a more even tone.

This peeling mask is also free from parabens, fragrances, and artificial colours, making it a safe and effective option for those with sensitive skin or allergies.

Experience the transformative power of the ENO Laboratoire Codexial Enoliss AHA Peeling Masks and reveal the glowing, rejuvenated skin you've always dreamed of.

How to use:

Apply a thin layer of the ENO Laboratoire Codexial Enoliss AHA Peeling Mask to clean, dry skin, avoiding the eye area. Leave on for 10-15 minutes, then rinse off thoroughly with warm water. Use once or twice a week, or as directed by your skincare professional. Always follow with a high SPF sunscreen during the day, as AHAs can make your skin more sensitive to the sun.

Composition & Ingredients:

The ENO Laboratoire Codexial Enoliss AHA Peeling Mask is composed of the following key ingredients: Water, Glycolic Acid, Lactic Acid, Citric Acid, Aloe Barbadensis Leaf Juice, Chamomilla Recutita (Matricaria) Flower Extract, Hydroxyethylcellulose, Sodium Hydroxide, Phenoxyethanol, Ethylhexylglycerin. Please note that the ingredient list may change or vary from time to time. Please refer to the ingredient list on the product package for the most up-to-date list of ingredients.

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